Product Portfolio of Ion Beam and Plasma Processing Equipment

Our wide range of ion beam and plasma processing equipment is flexible and modular in design, thus can be configured easily for research applications and for high volume production, for example in either a "cluster" or "inline" configuration. Our experienced and qualified team assists you to find the optimal system design for your production requirement.

Ion Beam Etching Systems

scia Mill 150

for full surface etching of substrates up to 150 mm

scia Mill 200

for full surface etching of wafers up to 200 mm

scia Mill 300

for full surface etching of wafers up to 300 mm

Ion Beam Trimming Systems

scia Trim 200

for precise surface correction
of wafers up to 200 mm

scia Trim 300

for large area surface correction of wafers up to 300 mm

scia Finish 1500

for polishing error correction on
substrates up to 1500 mm

Ion Beam Sputtering Systems

scia Coat 200

for high quality multilayer
deposition on up to 200 mm

scia Coat 500

for large area multilayer deposition on up to 500 mm x 300 mm

scia Opto 300

for high precision optical coatings on up to 300 mm dia.

Magnetron Sputtering Systems

scia Magna 200

for advanced wafer coatings
of up to 200 mm

scia Multi 300

for uniform multilayer deposition on wafers up to 300 mm dia.

scia Multi 500

for multilayer coating of large optics up to 500 x 300 mm

scia Multi 680

for multilayer coating of large
substrates up to 680 mm

scia Multi 1500

for multilayer coating of large
substrates up to 1500 mm

Product Overview

Download a PDF with our complete product and technology portfolio here ►.

Electron Beam Evaporation System

scia Eva 200

Glancing Angle Deposition for precise nano-structures on wafers up to 200 mm

Dry Cleaning Systems

scia Clean 800

for high-quality cleaning and qualification up to 800 mm dia. and 500 mm height

scia Clean 1000/1500/3000

for high-quality cleaning and qualification up to 3 m dia. and 3.4 m length

PECVD/RIE Systems

scia Batch 350

for 3D - coatings in batches

scia Cube 300

for large area coating and etching over 300 mm x 200 mm

scia Cube 750

for large area coating and etching over 750 mm x 750 mm

Tailor Made Solutions

Customized Systems

for your needs, in different configurations

scia Inline 400

for shaping and coating of high-quality razor blade tips

scia Cluster 200

One system for all your processes on wafers up to 200 mm.

Contact

scia Systems GmbH
Clemens-Winkler-Str. 6c
09116 Chemnitz
Germany

☎   +49 371 33561-561

✉   sales@scia-systems.com