Multilayer Coatings for Large Substrates up to 1500 mm in dia.

The scia Multi 1500 is designed for periodic multilayer coatings on curved substrates. With its superior process performance over multiple 100 multilayer periods, high precision homogeneous or gradient films are possible. The modular chamber concept with separate process chambers, buffer chambers, and loading chambers simultaneously allows high flexibility, regarding the tool configuration, and high throughput.

Features & Benefits

  • Homogeneous or gradient films on curved substrates by synchronized linear movement and spin rotation
  • Inline arrangement with multiple process and buffer chambers for complete crossing over the magnetrons
  • 4 magnetrons in each process chamber
  • Optional pretreatment with additional ion beam source
  • Substrate face-down orientation for minimized particle load


  • Gradient multilayer coatings of mirrors for soft X-ray and anti-reflective coatings
  • Multilayer stacks for X-ray mirrors for beam line and analytic applications
  • Multilayer coating for UV and VIS optics


  • Inline arrangement with 4 magnetrons in each process module
  • Linear substrate movement across magnetrons and superimposed rotation of the substrate


Magnetron Sputtering utilizes plasma ion bombardment on a target to deposit thin films on the substrate surface.

Detailled Information

Technical Data
Process Results

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Product Flyer scia Multi 1500


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Product Overview

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More Magnetron Sputtering Systems

scia Magna 200

for advanced wafer coatings
of up to 200 mm

scia Multi 300

for uniform multilayer deposition on wafers up to 300 mm dia.

scia Multi 680

for multilayer coating of large
substrates up to 680 mm