Expertise in Thin Film Technology
scia Systems develops ion beam and plasma process systems for nanometer-precise processing of surfaces. The company offers standard systems and customized tools using a wide range of coating and etching processes. Furthermore scia Systems is a capable and reliable service provider with a variety of services from classic support to retrofit of existing equipment.
scia Systems awarded the contract of an ion beam etching system for the Fraunhofer Institute for Microelectronic Circuits and Systems, IMS.
We are pleased to deliver a scia Mill 200 to Fraunhofer IMS. The ion beam etching system with end point detection will be integrated into the Institute's laboratory as part of the „Forschungsfabrik Mikroelektronik Deutschland“ funded by BMBF. It is primarily intended for process development and production of MEMS, like infrared detectors, pressure sensors and biocompatible MEMS systems. Thereby especially materials are structured, which cannot be etched by classical RIE or which have special geometries with high aspect ratios.