Expertise in Thin Film Technology

scia Systems provides precise surface processing equipment based on advanced ion beam and plasma technologies. The systems are applicable for coating, etching, and cleaning processes, especially for the MEMS, microelectronics, and precision optics industries. The process equipment is flexible and modular in design, thus can be easily configured for research applications and for high-volume production. It suits silicon wafer-based substrate sizes, smaller samples on carriers, and optical substrates with up to 3 m diameter.

Products

Discover our equipment for coating, etching and cleaning processes. The systems are flexible and modular in design. This enables us to offer standard as well as individual solutions for our customers all over the world.

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Applications

Our equipment is mainly used in the production of microelectronics, MEMS and precision optical components. However, there are also several applications in the field of astronomy, automotive and biomedical technology.

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Company

scia Systems stands for highly reliable equipment to meet expectations for today and the future. Our experienced and qualified team assists you to find the optimal system and process design for your production requirement.

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Career

Do you want to play an active role in a high-tech and fast-growing market environment and build up a successful career? We are always looking for new team members who want to grow with us.

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News

scia Mill 300: Structuring of complex multilayers on 300 mm wafers

Increased wafer-size means higher component yield. With our new system, scia Mill 300, you can benefit from all the advantages of ion beam etching on 300 mm wafers, such as excellent accuracy and uniformity, adjustable etch angle and processing of complex multilayers with inert and reactive gases.

Just like the other systems in the scia Mill-series, the scia Mill 300 has a full reactive gas compatibly, which enables reactive etch processes like reactive ion beam etching (RIBE) and chemically assisted ion beam etching (CAIBE).

Due to the flexible design, the system is suitable for high-volume and for small scale production.

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scia Mill 300

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