scia Systems provides precise surface processing equipment based on advanced ion beam and plasma technologies. The systems are applicable for coating, etching, and cleaning processes, especially for the MEMS, microelectronics, and precision optics industries. The process equipment is flexible and modular in design, thus can be easily configured for research applications and for high-volume production. It suits silicon wafer-based substrate sizes, smaller samples on carriers, and optical substrates with up to 3 m diameter.
Discover our equipment for coating, etching and cleaning processes. The systems are flexible and modular in design. This enables us to offer standard as well as individual solutions for our customers all over the world.
Find your suitable system:
scia Systems stands for highly reliable equipment to meet expectations for today and the future. Our experienced and qualified team assists you to find the optimal system and process design for your production requirement.
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Do you want to play an active role in a high-tech and fast-growing market environment and build up a successful career? We are always looking for new team members who want to grow with us.
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