Equipment for Ion Beam Sputtering

Ion beam sputtering or ion beam deposition is a PVD technology that produces especially smooth, uniform and defect-free thin films on the substrate.

A focused broad ion beam bombards the target material with high-energy ions, thereby the atoms of the material are ejected and condense as a thin coating on the substrate surface. By using various targets in one process chamber, multiple stacked layers, so-called multilayer coatings, can be produced with a high quality.

A special form of Ion beam sputtering is dual ion beam sputtering or dual ion beam deposition. By adding an assist ion beam source, a second ion bombardment is used to influence the growing film or pre-clean the substrate.