Equipment for Ion Beam Sputtering
Ion beam sputtering or ion beam deposition is a PVD technology that produces especially smooth, uniform and defect-free thin films on the substrate.
A focused broad ion beam bombards the target material with high-energy ions, thereby the atoms of the material are ejected and condense as a thin coating on the substrate surface. By using various targets in one process chamber, multiple stacked layers, so-called multilayer coatings, can be produced with a high quality.
A special form of Ion beam sputtering is dual ion beam sputtering or dual ion beam deposition. By adding an assist ion beam source, a second ion bombardment is used to influence the growing film or pre-clean the substrate.

Dual Ion Beam Sputtering in scia Coat 500
Ion Beam Sputtering Systems
High quality multilayer deposition on wafers up to 200 mm
- Ion Beam Sputtering (IBS)
- Dual Ion Beam Sputtering (DIBS)
- Ion Beam Etching (IBE)
Large area homogeneous multilayer coating for precision optics
- Ion Beam Sputtering (IBS)
- Dual Ion Beam Sputtering (DIBS)
- Ion Beam Etching (IBE)
Homogeneous coating of precision optics up to 300 mm dia.
- Ion Beam Sputtering (IBS)
- Dual Ion Beam Sputtering (DIBS)
More Information
- Not the right system yet? See our complete portfolio.
- Overview of Ion Beam and Plasma Processing Technologies
- Tailor Made Solutions
- Contact
Applications
Application Note: Dielectric Coatings
Ion Beam Sputter Deposition of Dielectric Films on Large Optical Substrates.
Overview of PVD Technologies
Comparison of ion beam sputtering, magnetron sputtering and evaporation.
Application Note: HR and AR Coatings
Ion Beam Sputtering for High- and Anti-Reflective Coatings
Ion beam technology for thin piezoelectric films
Video presentation: The advantages of ion beam technology for piezoelectric layers.