Equipment for Ion Beam Sputtering

Ion beam sputtering or ion beam deposition is a PVD technology that produces especially smooth, uniform and defect-free thin films on the substrate.

A focused broad ion beam bombards the target material with high-energy ions, thereby the atoms of the material are ejected and condense as a thin coating on the substrate surface. By using various targets in one process chamber, multiple stacked layers, so-called multilayer coatings, can be produced with a high quality.

A special form of Ion beam sputtering is dual ion beam sputtering or dual ion beam deposition. By adding an assist ion beam source, a second ion bombardment is used to influence the growing film or pre-clean the substrate.

Dual Ion Beam Sputtering in scia Coat 500

Ion Beam Sputtering Systems


High quality multilayer deposition on wafers up to 200 mm

  • Ion Beam Sputtering (IBS)
  • Dual Ion Beam Sputtering (DIBS)
  • Ion Beam Etching (IBE)


Large area homogeneous multilayer coating for precision optics

  • Ion Beam Sputtering (IBS)
  • Dual Ion Beam Sputtering (DIBS)
  • Ion Beam Etching (IBE)


Homogeneous coating of precision optics up to 300 mm dia.

  • Ion Beam Sputtering (IBS)
  • Dual Ion Beam Sputtering (DIBS)

More Information


Application Note: Dielectric Coatings

Ion Beam Sputter Deposition of Dielectric Films on Large Optical Substrates.

Overview of PVD Technologies

Comparison of ion beam sputtering, magnetron sputtering and evaporation. 

Application Note: HR and AR Coatings

Ion Beam Sputtering for High- and Anti-Reflective Coatings

Ion beam technology for thin piezoelectric films

Video presentation: The advantages of ion beam technology for piezoelectric layers.