Substrate size (up to) | 300 mm dia. |
Substrate holder | Substrate rotation up to 60 rpm, includes optical thickness monitor (OTM) and test glass changer |
Ion beam sources | Sputter source: 120 mm circular RF source (RF120-e) |
Neutralizer | RF driven plasma bridge neutralizer (N-RF) |
Target holder | Target drum with 6 water-cooled targets (each up to 300 mm x 300 mm) |
Base pressure | < 5 x 10-8 mbar |
System dimension (W x D x H) | 4.60 m x 1.80 m x 2.20 m, for single chamber with double substrate load lock (without electrical rack and pumps) |
Configurations | Single chamber with double substrate load lock |
Software interfaces | SECS II / GEM, OPC |
Precision in Optical Coating
The scia Opto 300 is used for uniform coating of precision optics. With up to 6 targets for flexible multilayer deposition, even a mixing of target materials is possible. Two loading positions allow continuous and fully automatic processing of the substrates. Optical in-situ monitoring with integrated test glass changer ensures highest precision and optimized uniformity of coating.
Features & Benefits
- Variable substrate sizes up to 300 mm dia.
- Automatic loading with two loading positions for continuous processing
- Up to 6 target materials on a rotatable trum, each target up to 300 mm x 300 mm, with optimized geometry for mixed layers or smooth transition between layers
- Excellent process uniformity by substrate rotation with up to 60 rpm
- In-situ optical thickness monitor (OTM) and test glass changer
- Optimized geometry for coating with low stress
Applications

Application Example: Anti-reflex coating of a multilayer stack consisting of Ta2O5
and SiO2 on TGG, designed to be transparent for typical laser lines of 633 nm
and 1064 nm | picture left: structure of the layer stack | picture right: Transmission spectra measured with transmission mode of ellipsometer. The target values of the reflectivity could be reached.
- Dielectric mirrors (e.g. rugate filters)
- Optical coatings for high- and anti-reflective layers, bandpass and notch filters
- High laser damage threshold coatings
- Deposition of refractive index gradient layers
- In-situ preprocessing of substrates (etching, cleaning, smoothing)
- Metallic, seed and protective coatings
Principle
- Primary source sputters material from a target to the facedown oriented substrate
- Secondary source used for pre-cleaning the substrate and / or assist during deposition
Technologies
Ion Beam Sputtering (IBS) thereby material is sputtered from a target with an ion beam and is deposited on the substrate.
Dual Ion Beam Sputtering (DIBS) uses an additional assist ion beam source to influence the growing film.