Latest Company News

The Advanced Mask Technology Center (AMTC) has acquired a new cluster system from scia Systems, with strategic support from Tekscend Photomask. The scia Cluster 215 is a state-of-the-art cluster system comprising two processing chambers and a central handling robot. It is specifically designed for ion beam etching of optical materials

Augmented reality (AR) and mixed reality (MR) have swiftly transitioned from a futuristic concept to a practical technology, altering the landscape of numerous sectors. For the development of lightweight near-eye displays, surface relief gratings (SRG) are employed to couple light from the source into the waveguide and then guide it out toward the eye. Ion beam trimming has been adapted as a versatile approach for creating SRGs with varying trench depths.

This study demonstrates how reactive ion beam trimming can be utilized to produce slanted surface relief gratings, featuring different grating geometries in terms of width and pitch, suitable for the specific requirements of nanoimprint lithography.

Read more

The scia Mill 200 enables reliable research work at the Competence Center for Nano System Technology at Kiel University, even for future generations of researchers.

The Institut National d’Optique (INO), the largest center of expertise in optics and photonics in Canada, has recently installed a scia Mill 200 system in their Quebec facility.

SPINTEC, one of the leading spintronics research laboratories worldwide, has recently installed a scia Coat 200. The system uses ion beam sputtering (IBS) to achieve smooth, dense, and defect-free thin-films that are used in the production of magnetic tunnel junctions.

scia Systems GmbH will showcase new capabilities at SEMICON Korea 2026, taking place February 11-13 at the COEX in Seoul, South Korea.

The company will present its industry-leading scia Mill series of ion beam etching (IBE) systems supporting high-precision, high-throughput semiconductor device manufacturing and failure analysis (FA). scia Systems will also highlight key advances in ion-beam processing for photonic integrated circuit (PIC) manufacturing.

The Chinese high‑tech enterprise Shenzhen Microgate Technology has expanded its cleanroom with a scia Trim 200. The system provides precise surface correction in thin-film and wafer materials using ion beam trimming. Film thickness non-uniformity can be improved down to 0.1 nm.

The research project "System and process development for the atomic layer deposition of aluminum-based thin films for barriers, actuators, and electronics – MultiALD" is working on new methods to produce thin films based on trimethylaluminum (TMA) using atomic layer deposition (ALD).