Substrate size (up to) | 400 mm x 200 mm, 200 mm dia. for spin rotation |
Sputter source | 6 rectangular magnetrons (203 mm x 89 mm), ion source possible |
Sputter modes | DC in CW or pulsed mode (1.5 or 3 kW) and/or RF (1.5 or 3 kW, 13.56 MHz) |
Base pressure | < 5 x 10-8 mbar |
System dimension (W x D x H) | 8.02 m x 1.34 m x 2.70 m (without electrical rack and pumps) |
Configuration | Inline system with load lock and loading station at both ends |
Software interface | SECS II / GEM, OPC |
Multilayer Coatings for Optical Substrates
The scia Magna series includes advanced magnetron sputtering systems designed for high-precision multilayer coatings on optical substrates, achieving (sub-)nanometer accuracy. Each system can be equipped with up to six magnetrons, allowing the deposition of complex multilayer stacks from different target materials without the need to break vacuum. The systems support the deposition of metal, oxide, and nitride layers with equal efficiency.
Equipped with automated substrate handling, the scia Magna 400 Inline, scia Magna 500 Inline, scia Magna 700 Inline and scia Magna 1200 Inline enable fully automated, recipe-driven processing. Precise, position-controlled substrate motion enables defined gradient layers and superior deposition uniformity.
Features & Benefits
- Multilayer coating with inline arrangement of multiple process sources
- Uniform or gradient films on optical substrates by synchronized linear movement and spin rotation
- Up to 6 magnetron sputter sources
- Optional surface treatment by ion source or additional ion beam source
- Vertical substrate orientation for minimized particle load
Applications
Alternating stack of (Si/Mo)23 for Bragg mirror. The results show very reproducible thicknesses of each period.
- Gradient multilayer coatings of mirrors for EUV
- Multilayer stacks for X-ray mirrors for beam line and analytic applications
- Multilayer coating for UV and VIS optics
Principle
- Inline arrangement with 6 magnetron sputter sources
- Linear substrate movement past magnetrons and superimposed substrate rotation
Technologies
Magnetron Sputtering utilizes plasma ion bombardment on a target to deposit thin films on the substrate surface.
Detailled Information
scia Magna 400 Inline
scia Magna 500 Inline
scia Magna 700 Inline
scia Magna 1200 Inline
Reach out
Please contact us for further information.
More Magnetron Sputtering Systems
scia Magna 200
for advanced wafer coatings
of up to 200 mm
scia Multi 300
for uniform multilayer deposition on wafers up to 300 mm dia.
