Substrate size (up to) | Individual sizes loaded on carrier, carrier size up to 450 mm x 400 mm |
Ion beam source | Two 380 mm linear microwave ECR sources (LIN380-e) |
Sputter source | Two rotatable magnetrons with 680 mm length |
Throughput | 12 Carrier/h ≈ up to 500,000 blades/h |
Base pressure | < 1 x 10-6 mbar |
System dimension (W x D x H) | 6.10 m x 1.60 m x 1.95 m, for 2 process chambers (without electrical rack) |
Configurations | Inline system with several etching and coating chambers, roller track transport system, 2 load locks and 2 atmospheric stations for loading and unloading |
Software interfaces | SECS II / GEM, OPC |
Ultra-Sharp Edges for Blades
The scia Inline 400 was designed for shaping the edges of high-quality blades - using ion beam etching and magnetron sputtering. The basic configuration of the system consists of two process units: The first one is equipped with an ion beam source for deburring and pre-cleaning of the blades. In the second process chamber opposite magnetron sputter sources are installed to coat both sides of the substrates simultaneously. The inline concept with two load locks enables a fast loading and unloading procedure, which results in a very high throughput. Furthermore, the modular design allows easy upgrading with additional process chambers as well as integration into existing production lines.
Features & Benefits
- Deburring station for ultra-sharp substrate edges
- Carrier-based handling to address various substrate dimensions
- Vertical layout enables double-sided processing for extreme high throughput in volume production
- Inline arrangement with multiple process chambers and roller track transport system
- Two load-locks for fast loading and unloading procedure, thus increased throughput
Applications
Tip shaping of cutter blades realized by ion beam etching. Left: Unsharpened blade with strong burr, Right: Optimized blade with smoothed
surface for better coating adhesion.
- Tip shaping of razor blades, microtome blades or sharp medical tools (syringes) for a durable coating adhesion
- Coating of adhesive and/or functional layers on razor blades and microtome blades
Principle
- Inline arrangement with linear substrate movement
- Chamber one with ion beam sources for pre-cleaning
- Chamber two with magnetrons for double-sided coating of the substrates
Technologies
Ion Beam Etching (IBE) / Ion Beam Milling (IBM)
uses a collimated beam of inert gas ions for material removal.
Magnetron Sputtering
utilizes plasma ion bombardment on a target to deposit thin films on the substrate surface.
Detailled Information
Technical Data
Process Results
Other Coating Systems
scia Coat 200
for high quality multilayer
deposition on up to 200 mm
scia Magna 200
for advanced wafer coatings
of up to 200 mm
