Product portfolio

Our wide range of ion beam and plasma processing equipment is flexible and modular in design, thus can be configured easily for research applications and for high volume production, for example in either a "cluster" or "inline" configuration. Our experienced and qualified team assists you to find the optimal system design for your production requirement.

Ion Beam Etching Systems

scia Mill 150

for full surface etching of
substrates up to 150 mm

scia Mill 200

for full surface etching of
wafers up to 200 mm

scia Trim 200

for precise surface correction
of wafers up to 200 mm

scia Finish 1500

for polishing error correction on
substrates up to 1500 mm

Ion Beam Sputtering Systems

scia Coat 200

for high quality multilayer
deposition on up to 200 mm

scia Coat 500

for large area multilayer deposition
on up to 500 mm x 300 mm

Magnetron Sputtering Systems

scia Magna 200

for advanced wafer coatings
of up to 200 mm

scia Multi 680

for multilayer coating for large
substrates up to 680 mm

scia Multi 1500

for multilayer coating for large
substrates up to 1500 mm

PECVD/RIE Systems

scia Batch 350

for 3D - coatings in batches

scia Cube 300

for large area coating and etching
over 300 mm x 200 mm

scia Cube 750

for large area coating and etching
over 750 mm x 750 mm

Dry Cleaning Systems

scia Clean 800

for high quality cleaning and qualification
up to 800 mm dia. and 500 mm height

scia Clean 1000/1500/3000

for high quality cleaning and qualification
up to 3 m dia. and 3.4 m length

Customized Systems

Tailor Made Solutions

for your needs, in different configurations