Multilayer Coatings for optical Substrates up to 500 x 300 mm

The scia Multi 500 is a magnetron sputtering system for multilayer coatings on optics at (sub-) nanometer precision. In a linear inline coating system with load locks at both ends, the vertically aligned substrate moves in front of six magnetrons with different target materials and an optional ion source. The precise position-controlled movement of the substrate enables defined gradient layers and superior deposition uniformity.

Features & Benefits

  • Multilayer coating with inline arrangement of multiple process sources
  • Uniform or gradient films on optical substrates by synchronized linear movement and spin rotation
  • 6 linear magnetron sputter sources
  • Optional surface treatment by ion source
  • Vertical substrate orientation for minimized particle load


  • Gradient multilayer coatings of mirrors for EUV
  • Multilayer stacks for X-ray mirrors for beam line and analytic applications


  • Inline arrangement with 6 magnetron sputter sources
  • Linear substrate movement past magnetrons and superimposed substrate rotation


Magnetron Sputtering utilizes plasma ion bombardment on a target to deposit thin films on the substrate surface.

Detailled Information

Technical Data
Process Results

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More Magnetron Sputtering Systems

scia Multi 300

for uniform multilayer deposition on wafers up to 300 mm dia.

scia Multi 680

for multilayer coating of large
substrates up to 680 mm

scia Multi 1500

for multilayer coating of large
substrates up to 1500 mm