Magnetron Sputtering Systems
Dynamic Deposition for Large Area Substrates
Multilayer coatings with up to 4 magnetrons on 300 mm wafers
- Magnetron Sputtering
(Dynamic deposition with 4 magnetrons, circular movement of the substrate)
Multilayer coatings for optical substrates up to 500 x 300 mm
- Magnetron Sputtering
(Dynamic deposition with 6 magnetrons, linear movement of the substrate)
Simultaneous coating of two substrates up to 680 mm dia.
- Magnetron Sputtering
(Dynamic deposition with 6 magnetrons, circular movement of the substrate)
Flexible multi-chamber coating system for substrates up to 1500 mm dia.
- Magnetron Sputtering
(Dynamic deposition with 4 magnetrons in each process module, linear movement)
Static Deposition on Wafers
Advanced wafer coatings with high rates on wafers up to 200 mm
- Magnetron Sputtering
(Single-Magnetron Sputtering or Confocal Sputtering)
More Information
- Not the right system yet? See our complete portfolio.
- Overview of Ion Beam and Plasma Processing Technologies
- Tailor Made Solutions
- Contact
