Reactive Ion Etching of Large-Area Computer Generated Holograms

Ultra-precise manufacturing of large aspherical lenses has become a main challenge for future EUV lithography. To control the quality of these lenses, computer-generated holograms (CGH) are used, which have the capability to be much more accurate and precise compared to any other optical testing method.

CGH consists of a calculated interference pattern with features of submicron size. This pattern is transferred on a transparent substrate by writing the pattern into a photoresist (PR) mask placed on a thin chromium layer.

The fabrication of Computer Generated Holograms (CGH) on large areas requires dry etching methods and systems capable for the large substrate sizes. In this White Paper, the author Robert Rückriem demonstrates CGH structuring with a size of 450 mm x 450 mm using the dry etching system scia Cube 750.

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