DIAS Infrared from Dresden, a leader in the field of infrared technology, ordered an Ion Beam Etching System scia Mill 150. The System is designed for etching of lithium tantalate used for the production of technologically sophisticated infrared sensors.
The Ion Beam System scia Mill 150 will be installed at the production site in Dresden in June 2014. The systems stands out due to its robust design and flexibility. It provides a good etching uniformity with a high etch rate by using a microwave ion beam source MW218-e. Additionally, the sample temperature is controlled by using a helium backside cooling.