Again, Fraunhofer Gesellschaft relies on one of scia Systems’ ion beam etching tools. scia Systems was awarded for a scia Mill 200 by Fraunhofer Institute of Electronic Nano Systems ENAS. The tool will be installed in Chemnitz and will be used for patterning of magnetic multilayers for GMR-stacks (giant-magneto-resistance) or TMR-stacks (tunnel-magneto-resistance) on standardized 200 mm silicon wafers.