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scia Mill 200 for Fraunhofer ENAS

Again, Fraunhofer Gesellschaft relies on one of scia Systems’ ion beam etching tools. scia Systems was awarded for a scia Mill 200 by Fraunhofer Institute of Electronic Nano Systems ENAS. The tool will be installed in Chemnitz and will be used for patterning of magnetic multilayers for GMR-stacks (giant-magneto-resistance) or TMR-stacks (tunnel-magneto-resistance) on standardized 200 mm silicon wafers.