scia Systems obtains an order for a scia Etch 300 by Ernst-Abbe-University Jena
SEM image of an anti-reflective nanostructure in quartz glass produced by a RIE process. (© Max Planck Institute for Medical Research & EAH Jena)
The scia Etch 300 system enables anisotropic reactive ion etching on flat substrates and voluminous three-dimensional objects.
Chemnitz, Germany, March 21, 2024 — scia Systems GmbH, the industry leader in advanced ion beam and plasma process equipment for microelectronics, MEMS, and precision optics industries, today announced that the Ernst Abbe University of Applied Sciences Jena, the largest and most research-intensive university of applied sciences in Thuringia, has purchased a scia Etch 300. The system will produce advanced optical surfaces with anti-reflective nanostructures using a unique reactive ion etching (RIE) process.
Production of anti-reflective nanostructures on 3D surfaces
In many areas of modern optical technology, a reflective effect is unwanted. The conventional method of reducing or preventing reflection on a surface is to apply one or more additional thin layers. However, producing multilayer coatings is complex and expensive.
In comparison, implementing anti-reflective nanostructures on optical substrates has several physical advantages, including the absence of constructive interference effects, a minor dependence on the angle of incidence and the wavelength of the radiation, and the prevention of possible layer ablation. Due to these properties, the optics industry is endeavoring to develop nanostructure processes and premium anti-reflective coatings suitable for flat substrates and voluminous, spherical, and aspherical lenses.
As part of the "arivo3d" project, a new method for producing nanostructured surfaces is being developed at the Ernst Abbe University of Applied Sciences in Jena: Inspired by nocturnal insects, in particularly moths, the new cone-shaped anti-reflective nanostructures aim to achieve broadband anti-reflective coatings without the need for conventional thin films.
scia Etch 300 - a key to the production of optical surfaces
The EAH Jena produces these anti-reflective nanostructures with the scia Etch 300 system. Reactive ion etching (RIE) is used to structure flat substrates with diameters of up to 300 mm, as well as highly curved, voluminous, three-dimensional objects such as lenses, mirrors, and prisms. In this way, it is possible to continue the development of low-reflection optical components and significantly accelerate the development of anti-reflective nanostructures.
- More information can be found here: Learning: Reactive ion etching of anti-reflective nanostructures
- Learn more about the technology of reactive ion etching.
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About scia Systems GmbH
Founded in 2013, scia Systems is a technology leader in thin-film process equipment based on advanced ion beam and plasma technologies. The systems are used for coating, etching, and cleaning processes with nanometer resolution and have been successfully implemented in various high-tech industries worldwide, including microelectronics, MEMS, and precision optics industries. For more information, visit the company’s website at www.scia-systems.com.
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scia Systems GmbH
Mandy Gebhardt
Head of Marketing
Tel.: +49 371 33561 322
E-Mail: m.gebhardt@scia-systems.com
