scia Systems awarded the contract of an ion beam etching system for the Fraunhofer Institute for Microelectronic Circuits and Systems, IMS.
We are pleased to deliver a scia Mill 200 to Fraunhofer IMS. The ion beam etching system with end point detection will be integrated into the institute's laboratory as part of the „Forschungsfabrik Mikroelektronik Deutschland“ funded by BMBF. It is primarily intended for process development and production of MEMS, like infrared detectors, pressure sensors, and biocompatible MEMS systems. Thereby, especially materials are structured, which cannot be etched by classical RIE or which have special geometries with high aspect ratios.