Magnetron Sputtering Systems

Dynamic Deposition for Large Area Substrates

 

Simultaneous coating of two substrates up to 680 mm dia.

  • Magnetron Sputtering

 

Flexible multi-chamber coating system for substrates up to 1500 mm dia.

  • Magnetron Sputtering

Static Deposition on Wafers

 

Advanced wafer coatings with high rates on wafers up to 200 mm

  • Magnetron Sputtering
    (Single-Magnetron Sputtering or Confocal Sputtering)

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