Ion Beam Etching Systems

Full Surface Etching

 

System for small scale production and R&D applications of substrates up to 150 mm

  • Ion Beam Etching
  • Reactive Ion Beam Etching
  • Chemically Assisted Ion Beam Etching

 

Fully production proven system for mass production of wafers up to 200 mm

  • Ion Beam Etching
  • Reactive Ion Beam Etching
  • Chemically Assisted Ion Beam Etching

Local Surface Correction

 

High-volume production system for film thickness correction of wafers up to 200 mm

  • Ion Beam Trimming
  • Ion Beam Figuring

 

Polishing error correction of high-precision optical elements up to 1500 mm dia.

  • Ion Beam Figuring
     

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