High Quality Cleaning and Qualification up to 3 m in dia. and 3.4 m in length

The scia Clean 1000/1500/3000 systems are used for dry cleaning of 3 dimensional shaped substrates with weights up to 14 tons. The chamber design and functionality ensures a very good base pressure and allows to quantify even small residual contaminations on the substrate by mass spectroscopy measurement.

Features & Benefits

  • Low base pressure and fast pumping due to electro-polished and heated vacuum chamber
  • Separate substrate heating for improved desorption
  • Qualification of residual contamination by high sensitive mass spectroscopy
  • Selectable quantity of plasma sources for advanced cleaning with H2 plasma
  • Recipes for repeatable temperature ramps and fully automated cleaning cycles
  • Transfer system for loading of heavy substrates
scia Clean 1000
scia Clean 1500

Applications

  • Ultra-high purity cleaning of X-ray optics
  • Cleaning of components for beam line accelerators
  • Outgassing qualification of complex vacuum assemblies

Principle

  • Dry Cleaning
    • Removing of contamination from the 3-dimensional shaped substrates by using ultra high vacuum
      (vacuum desorption)
    • Further cleaning progress with optional heating of the substrate and/or chamber (thermal desorption) and applying plasma treatment

Technical Data

 

scia Clean 1000

scia Clean 1500

scia Clean 3000

Substrate size (up to)

1000 mm dia., 850 mm length, 500 kg

1500 mm dia., 1700 mm length, 2 t

3000 mm dia., 3400 mm length, 14 t

Substrate heating

Radiation heaters (7.5 kW) up to 250 °C

Radiation heaters (20 kW) up to 250 °C

Radiation heaters (40 kW) up to 250 °C

Chamber heating
and cooling

Pressurized water based heating up to 150 °C and cooling (16 kW)

Pressurized water based heating up to 150 °C and cooling (48 kW)

Pressurized water based heating up to 150 °C and cooling (96 kW)

Plasma sources

Up to 2 optional ICP plasma sources (PI400), max. 2.5 kW per source

Up to 10 optional ICP plasma sources (PI400), max. 2.5 kW per source

Up to 12 optional ICP plasma sources (PI400), max. 2.5 kW per source

Base pressure

< 5 x 10-9 mbar

< 5 x 10-8 mbar

< 5 x 10-8 mbar

Quality control

Mass spectrometer for quantitative outgassing measurement

System dimension (W x D x H)

1.60 m x 1.80 m x 2.70 m
(without electrical rack and pumps)

8.00 m x 4.20 m x 3.60 m
(without electrical rack and pumps)

15.00 m x 5.50 m x 4.80 m
(with electrical rack and pumps)

Configurations

Single chamber with front door, manual loading with transport wagon

Single chamber with front door, loading via transfer system with transport carriers

Software interfaces

SECS II / GEM, OPC

SECS II / GEM, OPC

SECS II / GEM, OPC

More Dry Cleaning Systems

scia Clean 800

for high quality cleaning and qualification
up to 800 mm dia. and 500 mm height