Structuring of Spintronic Sensors by Ion Beam Milling with in situ Insulator Deposition
M. Nestler, S. Rumbke, E. Loos - scia Systems GmbH, A. Böhnke, N. Dohmeier - Bielefeld University
We demonstrate that high quality CoFeB/MgO/CoFeB magnetic tunnel junctions (MTJs) can be produced by combining magnetron sputtering, UV lithography, and ion beam milling (IBM). Particularly, we study the effect of different milling angles on the tunneling magnetoresistance (TMR). Furthermore, we investigate the quality of devices manufactured by depositing the insulator in situ subsequent to milling. Using a secondary ion mass spectrometer (SIMS), all layers can be detected while milling, enabling us to precisely define the mill stops. We found TMR values of up to 140% for a milling angle of 30° and 90% for a two angles milling process at 20° and 65°, proving that no critical sidewall redeposition of conductive material takes place.
Zum Download des Papers folgen Sie dem Link: http://www.ama-science.org/proceedings/details/2653
Fabrication of high-sensitivity pyroelectric sensors by ion beam etching
R. Rückriem, M. Zeuner - scia Systems GmbH, R. Köhler - DIAS INFRARED GMBH
Ion beam etching of pyroelectric sensors made of lithium tantalate (LT) is presented in order to get a higher specific detectivity D* compared to standard sensors. We present the etching tool which applies argon ion beam etching in production environment. The etching homogeneity was investigated by a standard silicon oxide etch and a twelve hour silicon etch with photoresist mask. Both show a homogeneity of +/- 0.7 % and a good compliance. Further investigations were done in a twelve hour process regarding the stability of the ion current regulation and ion current density. In the first two hours after process start, the main variation of power and ion current density takes place. Afterwards, the system reached a steady-state. After etching of the LT samples, an analysis of the removed material and emerged etching walls was done. Finally, the important D* was compared between an ion-etched and a non-ion etched pyroelectric sensor.
Zum Download des Papers folgen Sie dem Link: http://www.ama-science.org/proceedings/details/2406
New coating system for direct-deposition of sensors on components of arbitrary size: A novel approach allowing for thinner sensors with higher measuring accuracy
D. Klaas, J. Becker, M. C. Wurz - Institute of Micro Production Technology, Leibniz Universität Hannover,
J. Schlosser, M. Kunze – scia Systems GmbH
A new coating system for the deposition of sensors and thin-layers directly onto components of arbitrary size has been invented at the Institute of Micro Production Technology. This system allows for thinner sensors without any carrier substrate and with a higher measuring accuracy. Within this paper, the basic setup and the functional principle of the new coating system is presented. The deposition process sequence is described and the system is characterized concerning layer homogeneity and evacuation time.
Zum Download des Papers folgen Sie dem Link: https://ieeexplore.ieee.org/abstract/document/7808440/
Multilayer coating of optical substrates by ion beam sputtering
M. V. Daniel, M. Demmler – scia Systems GmbH
Ion beam sputtering is well established in research and industry, despite its relatively low deposition rates compared to electron beam evaporation. Typical applications are coatings of precision optics, like filters, mirrors and beam splitter. Anti-reflective or high-reflective multilayer stacks benefit from the high mobility of the sputtered particles on the substrate surface and the good mechanical characteristics of the layers. This work gives the basic route from single layer optimization of reactive ion beam sputtered Ta2O5 and SiO2 thin films towards complex multilayer stacks for high-reflective mirrors and anti-reflective coatings. Therefore films were deposited using different oxygen flow into the deposition chamber Afterwards, mechanical (density, stress, surface morphology, crystalline phases) and optical properties (reflectivity, absorption and refractive index) were characterized. These knowledge was used to deposit a multilayer coating for a high reflective mirror.
To download the paper, follow the link: https://doi.org/10.1117/12.2279788