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In order to cover the entire spectrum of vocational education, scia Systems works together with the Bildungs-Werkstatt Chemnitz additional to its own vocational training. This joint apprenticeship enables us to convey all educational contents to our trainees, according the Vocational Training Act. The Bildungs-Werkstatt Chemnitz, with its modern and qualified educational offerings, is a strong partner in continuously improving our apprenticeship quality today and in the future.

We look forward to continuing our successful cooperation. You can find our vacancies for apprenticeship in 2020/21 here.

Again, Fraunhofer Gesellschaft relies on one of scia Systems’ ion beam etching tools. scia Systems was awarded for a scia Mill 200 by Fraunhofer Institute of Electronic Nano Systems ENAS. The tool will be installed in Chemnitz and will be used for patterning of magnetic multilayers for GMR-stacks (giant-magneto-resistance) or TMR-stacks (tunnel-magneto-resistance) on standardized 200 mm silicon wafers.

scia Systems awarded the contract of an ion beam etching system for the Fraunhofer Institute for Microelectronic Circuits and Systems, IMS.  

We are pleased to deliver a scia Mill 200 to Fraunhofer IMS. The ion beam etching system with end point detection will be integrated into the institute's laboratory as part of the „Forschungsfabrik Mikroelektronik Deutschland“ funded by BMBF. It is primarily intended for process development and production of MEMS, like infrared detectors, pressure sensors, and biocompatible MEMS systems. Thereby, especially materials are structured, which cannot be etched by classical RIE or which have special geometries with high aspect ratios.

Together with project partners scia Systems is working within the ALMET project on the development of systems and processes for the atomic layer deposition of metallic thin films (mALD). The objective of the project is the conformal deposition of copper and cobalt thin films within an industrial-suited ALD reactor. The reactor allows plasma assisted ALD (PALD) by a special chamber-in-chamber layout and enables a variety of different ALD processes. scia Systems is pleased to support the project with its experience and know-how.

We are taking part in the week of open companies and open our doors on 15-03-2019 from 14 o'clock for interested pupils. We will present our company and our apprenticeships.

The registration form and further information can be found here.

We look forward to your visit!

In order to cover the entire spectrum of vocational education, scia Systems works together with the Bildungs-Werkstatt Chemnitz additional to its own vocational training. This joint apprenticeship enables us to convey all educational contents to our trainees, according the Vocational Training Act. The Bildungs-Werkstatt Chemnitz, with its modern and qualified educational offerings, is a strong partner in continuously improving our apprenticeship quality today and in the future.

We look forward to continuing our successful cooperation. You can find our vacancies for apprenticeship in 2019/20 here.

The Fraunhofer Institute for Reliability and Microintegration (IZM) has awarded scia Systems the contract for an ion beam etching system.

The equipment is funded by BMBF within „Forschungsfabrik Mikroelektronik Deutschland“ and it is primary intended for fabrication of metallic microstructures on semiconductor substrates. Depending on the metal to be etched and its position inside of a layer stack, the system uses inert gases, e.g. Argon, as well as reactive gases, or mixtures thereof.

We are pleased to deliver a scia Mill 300, designed for processing of 300 mm wafers, to Fraunhofer IZM. Core component of the system is a new developed ion beam source for those substrates sizes. With the further development of the existing product portfolio, scia Systems can better serve customer wishes for larger substrates.

Together with 30 project partners from 8 European countries scia Systems is working on the HiPERFORM - project to introduce wide band-gap power electronics in the drivetrain of electric vehicles. The main research objectives of the project are: cost reduction, energy efficiency, and less volume of the devices. Research will focus on both new materials and improved manufacturing processes, such as the cost-effective deposition of gallium nitride (GaN) by magnetron sputtering. The topic of scia Systems is the development of a substrate holder which meets the special requirements regarding temperature and process time.

The Institute of Solar Fuels of the Helmholtz-Zentrum Berlin für Materialien und Energie (HZB) has awarded scia Systems the contract for a cluster coating system.

With the system the HZB will deposit nanostructured thin films for the fabrication of photoelectrodes, which are used for efficient fuel production by splitting water into hydrogen and oxygen. The generation of such nanostructures requires layer coating by a particular PVD technique called glancing angle deposition (GLAD).

The scia Vario 100 implements the GLAD principle with a self-developed substrate holder in conjunction with an automatic slit aperture. Available process parameters involve tilting, rotation, and temperature control of the substrate holder. In addition, the distance to the coating source, as well as the slit width, and speed can be adjusted to reach the desired process results. The deposition takes place in separate process chambers using electron beam evaporation and dual ion beam sputter deposition (DIBD).

scia Systems is supplying a scia Trim 200 to the Canandaigua, NY manufacturing facility of Akoustis Technologies, Inc. Akoustis® is a RF filter solutions company manufacturing a unique, patented XBAW™ technology to produce single-crystal bulk acoustic wave (BAW) RF filters for mobile and other wireless markets.

The scia Trim 200 will be used to trim BAW devices precisely to specified frequencies, helping Akoustis to maximize yield, lower costs, and optimize quality. scia Systems provides not only systems, but award-winning service and technical support to help manufacturers reach their production goals.