Latest Company News

With the substrate holder designed by scia Systems, epitaxial Aluminum Nitride (epi-AlN) can now be deposited on silicon (111). This is an important step for the development of GaN-based switch technologies. As these have up to 30% less energy losses compared to existing architectures, they can be used to produce more affordable and efficient electric and hybrid vehicles.

Increased wafer-size means lower costs. With our new system, scia Mill 300, you can benefit from all the advantages of ion beam etching on 300 mm wafers, such as excellent accuracy and uniformity, adjustable etch angle and processing of complex multilayers with inert and reactive gases.

Just like the other systems in the scia Mill-series, the scia Mill 300 has a full reactive gas compatibly, which enables reactive etch processes like reactive ion beam etching (RIBE) and chemically assisted ion beam etching (CAIBE).

Due to the flexible design, the system is suitable for high-volume and for small scale production.

As modern chip design pushes for smaller, more powerful and more compact devices, reverse engineering requires delayering with highest accuracy within the µm-, nm and atomic thickness range for different materials at once. Ion beam etching is capable to meet these strict requirements.

Learn more in our new application note.

With the increasing digitalization of conferences and exhibitions, we had to rethink and go a new way to present ourselves and our range of services.

You can see the result here: Our new video gives you a little insight into scia Systems in 30 seconds.

We have an exciting year ahead of us, with many opportunities, but also challenges. The biggest challenge this year will probably be the move to our new location, starting in April.

We are very optimistic about the future and we wish all suppliers, customers and partners a successful, healthy and exciting 2021.

Last year scia Systems won a public tender of a high precision film thickness trimmer tool for 200 mm wafer processing from the Institute of Microelectronics (IME) at the Agency for Science, Technology and Research (A*STAR) in Singapore.

We are happy that the scia Trim 200 was shipped, built up and installed despite the difficult conditions due to the pandemic. We like to thank our partner Nanyang Equipment Pte Ltd. for their great job and their support.

A team of ZEISS, Trumpf and Fraunhofer experts made a significant contribution to the development and industrial maturity of the EUV technology and has now been honored for this.

We congratulate our customer ZEISS together with Trumpf and Fraunhofer experts on being awarded for the “Deutscher Zukunftspreis” (German Future Prize) 2020 for their project » EUV Lithography - New Light for the Digital Age« .

Unfortunately, the current situation did not allow us to meet with all our sales partners in person as we have done in the past years. Nevertheless, we wanted to stay in contact and share our latest developments and product achievements. Thankfully, we found a way to bring us all together!

A big THANK YOU to the whole team for your time and efforts!

If you would like to get in touch with one of our sales partners, you can find their contact information here: bit.ly/scia_worldwide

On September 25th, during the “Spätschicht”-event (engl. late shift) organized by the Industriekultur Chemnitz, a total of 24 visitors were able to have a look at our clean rooms, talk to employees and get to know our systems. Our guests did not only gain a small insight into the exciting application options of ion beam and plasma technologies, ...

Last Friday we finally celebrated our topping-out ceremony together with OBAG. Despite distance rules it was a very nice celebration, where our employees and business partners could already get a first impression of our new location.