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EUV developers from TRUMPF, ZEISS and Fraunhofer awarded for the "Deutscher Zukunftspreis" 2020
EUV lithography enables the production of much more powerful, energy-efficient and cost-effective microchips than ever before. This is the only solution which can make future technologies such as artificial intelligence or autonomous driving possible, because it enables massive computing power in a micro size.
A team of ZEISS, Trumpf and Fraunhofer experts made a significant contribution to the development and industrial maturity of the EUV technology in their project » EUV Lithography - New Light for the Digital Age« and has now been honored for this.
We congratulate our customer ZEISS together with Trumpf and Fraunhofer experts on being awarded for the “Deutscher Zukunftspreis” (German Future Prize) 2020.
At the award ceremony on November 25, 2020, the German Federal President Frank-Walter Steinmeier presented the German Future Prize, endowed with 250,000 euros, to the developers Dr. Sergiy Yulin, Fraunhofer Institute for Applied Optics and Precision Engineering (IOF), Dr. Peter Kürz, ZEISS Semiconductor Manufacturing Technology (SMT) and Dr. Michael Kösters, TRUMPF Lasersystems for Semiconductor Manufacturing.
Process Equipment for EUVL
scia Systems also contributes to the further development of EUVL technology and therefore enables significant progress in digitalization. We designed equipment for multilayer deposition on large area substrates as well as UHV cleaning systems especially for EUVL applications.