The scia Mill 200 system is ideally suited for full-surface structuring of complex multilayers.

Chemnitz, February 23, 2026 - scia Systems GmbH, the industry leader in advanced ion beam and plasma process equipment for microelectronics, MEMS, and precision optics industries, today announced that the Institut National d’Optique (INO), the largest center of expertise in optics and photonics in Canada, has recently installed a scia Mill 200 system in their Quebec facility.

Full-Surface Ion Beam Etching with scia Mill 200

Ion beam etching with nanometer and sub-nanometer precision is used in the MEMS industry to etch various metals, dielectric materials, and microchip structures. It also enables high-precision optical component patterning and can fabricate 3D optoelectronic microstructures, as well as other photonic structures, such as waveguides and gratings.

The scia Mill 200 is designed to structure complex multilayers in any material, including upcoming materials of interest such as LNOI and SiC. A circular ion beam source etches the entire substrate surface at a defined angle. Due to its fully reactive gas compatibility, the system enables reactive ion beam etching processes with enhanced selectivity and the highest etching rate. Different endpoint detection systems can be integrated for high-quality process control. The flexible design of the scia Mill series allows it to be adapted as a single-substrate version and in a high-volume production cluster layout with up to three process chambers and two cassette load locks.

Reactive Ion Beam Etching (RIBE) and Chemically Assisted Ion Beam Etching (CAIBE) for Waveguide Processing 

The scia Mill 200 system installed at INO can process waveguides and other optical devices using RIBE (Reactive Ion Beam Etching) and CAIBE (Chemically Assisted Ion Beam Etching) technology, special forms of ion beam etching that utilize reactive gases in addition to inert gases, e.g., to increase selectivity, influence trench angles, or enhance etch rates. 

“scia Systems is pleased to have been selected as a trusted supplier by the INO, a world leader in high technology, as one of the ion beam solution providers for producing their devices," stated Dr. Michael Zeuner, CEO of scia Systems. “We are proud to support their exceptional research for optoelectronics."

• For more information on the scia Mill 200 system, please visit www.scia-systems.com/scia-mill-200.
   
• Learn more about the technology of ion beam etching / ion beam milling.
   
• Do you have any questions? Our team will be happy to help you. Contact us!

About scia Systems GmbH

Founded in 2013, scia Systems is a technology leader in thin-film process equipment based on advanced ion beam and plasma technologies. The systems are used for coating, etching, and cleaning processes with nanometer resolution and have been successfully implemented in various high-tech industries worldwide, including microelectronics, MEMS, and precision optics industries. For more information, visit the company’s website at www.scia-systems.com.

About INO (Institut national d'optique)

Canada's largest center of expertise in optics and photonics, INO creates and develops custom solutions to meet the needs of Quebec and Canadian companies in a wide range of industries. As a leader in high technology, INO has implemented over 7,500 solutions, carried out 77 technology transfers, and contributed to the creation of 35 new companies employing over 2,000 people. INO's activities are made possible through the ongoing partnerships with the Ministère de l'Économie, de l'Innovation et de l’Énergie, and Canada Economic Development for Quebec Regions. www.ino.ca
 

Company Contact

Mandy Gebhardt
Head of Marketing
scia Systems GmbH
Tel: +49 371 33561 322
E-Mail: m.gebhardt@scia-systems.com