The Shenzhen International Quantum Academy (IQASZ) Expands its Micro- and Nanofabrication Capabilities with Ion Beam Equipment from scia Systems

The scia Mill 150 provides high-precision ion beam etching. Even complex structures can be created using a defined incidence angle and adjustable ion energy.

The Shenzhen International Quantum Academy (IQASZ) is a research institute in Shenzhen that conducts fundamental and applied research in quantum technologies – such as quantum computing, sensing, and devices.

The scia Mill 150 system is ideally suited for full-surface structuring of complex multilayers.

Chemnitz, Germany, April 1, 2026 – scia Systems GmbH, the industry leader in advanced ion beam and plasma process equipment for microelectronics, MEMS, and precision optics industries, today announced that the Shenzhen International Quantum Academy (IQASZ) has recently purchased a scia Mill 150 system to strengthen its advanced research infrastructure. The new system will support pioneering research and development in quantum technology, semiconductor technology, photonics, and advanced materials science.

Full-Surface Ion Beam Etching with scia Mill 150 

The scia Mill 150 is a high-precision ion beam etching system designed for processing substrates up to 150 mm in diameter. Using a focused broad ion beam, the system enables highly controlled material removal, allowing researchers to create complex micro- and nanostructures with exceptional accuracy and uniformity. It is widely used in applications such as semiconductor device fabrication, MEMS development, photonic component manufacturing, and materials analysis. Its flexible process capabilities support both physical ion beam etching and chemically assisted etching, providing excellent selectivity and repeatability across a wide range of materials. 

Structuring and Passivation of TMR sensors

The Shenzhen International Quantum Academy will use the scia Mill 150 for the fabrication of tunneling magnetoresistance (TMR) devices. Ion beam etching (IBE) provides material-independent pattern transfer, which is required for structuring the complex multilayer stacks of TMR sensors. The argon-based process enables controlled and reproducible removal of all materials within the TMR stack.
In addition to the ion beam source, the system supplied to IQASZ features an integrated magnetron sputtering source. This configuration enables both structuring and in-situ passivation of the multilayer stack. Combining etching and consecutive passivation without vacuum breakage within a single vacuum chamber improves process and device stability.

“We are proud to support the Shenzhen International Quantum Academy with the installation of the scia Mill 150, a system designed to enable precise and reliable nanofabrication,” said Dr. Michael Zeuner, CEO of scia Systems. “This collaboration reflects our ongoing efforts to provide leading research institutions worldwide with advanced ion beam technology that enables innovation in semiconductors, photonics, and next-generation devices.”

By integrating the scia Mill 150 into its research facilities, IQASZ reinforces its commitment to providing state-of-the-art tools for both fundamental research and applied technology development. The system will play a key role in enabling discoveries and accelerating the development of future electronic, photonic, and microelectromechanical systems.

 

 

scia Systems Standort

About scia Systems GmbH

Founded in 2013, scia Systems is a technology leader in thin-film process equipment based on advanced ion beam and plasma technologies. The systems are used for coating, etching, and cleaning processes with nanometer resolution and have been successfully implemented in various high-tech industries worldwide, including microelectronics, MEMS, and precision optics industries. For more information, visit the company’s website at www.scia-systems.com.
 

 

Company Contact

Marketing
scia Systems GmbH
Tel: +49 371 33561 172
E-Mail: marketing@scia-systems.com

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