scia Systems wins tender for a cluster system for Fraunhofer ENAS

The scia Cluster 200 is a modular platform for thin-film vacuum processes on substrates up to 200 mm: Fraunhofer ENAS will use the system to manufacture innovative micro- and nanoelectronics on wafers up to 200 mm in diameter.

The Fraunhofer Institute for Electronic Nano Systems ENAS purchases a scia Cluster 200 for the development of micro- and nanoelectronics

Chemnitz, Germany, Oct. 23, 2025 – scia Systems GmbH, the industry leader in advanced ion beam and plasma process equipment for microelectronics, MEMS, and precision optics industries, today announced the award of a highly advanced cluster system by the Fraunhofer ENAS (Institute for Electronic Nano Systems). The scia Cluster 200 will be used for research and development of innovative technologies that are crucial for heterogeneous integration, photonic circuits, and quantum technologies. 

Highest flexibility for research, development and production

The scia Cluster 200 is a versatile and modular platform for precise thin-film processing based on ion beam and plasma technologies. It enables industry-oriented research, particularly in the fields of heterogeneous integration, CMOS hybrid bonding, and photonic interconnects for communication and quantum technologies. Several chambers with different process technologies can be combined at a central loading unit for coating, etching, or cleaning of substrates up to 200 mm. This ensures the highest flexibility for industrial applications in semiconductor and precision optics manufacturing, as well as for individual research and development projects.

For maximum productivity in volume production, scia Systems provides single-process clusters. One or more vacuum locks are connected to a central transfer chamber and up to five identical process chambers. This significantly increases throughput while requiring less space and at lower cost compared to single-chamber systems.

Multi-process clusters are used for complex, multi-stage processes in research and development. Different coating, etching, and cleaning processes run sequentially in the same system without interrupting the vacuum. This reduces the overall process time. Contamination and oxidation are prevented, and the surface quality remains consistently high. Process chambers can be easily replaced or expanded at any time, ensuring a high level of sustainability.

Magnetron sputtering and ion beam etching with nanometer precision 

Fraunhofer ENAS will use the scia Cluster 200 to develop advanced technologies around heterogeneous integration for chip interfaces and interposers, which are needed to integrate different materials and technologies. The system is suitable for processing wafers up to 200 mm in diameter and is equipped with a load lock and transfer chamber with handling robot, two magnetron sputter chambers, and an ion beam etching system. The scia Cluster 200 uses ultra-precise processes. Ion beam etching enables the structuring of a wide range of materials at atomic layer level - including metals, semiconductors, polymers, and ceramics. Magnetron sputtering is used to deposit passivation layers and ultra-thin metal layers in the nano and sub-nanometer range. 
"We are very pleased that Fraunhofer ENAS relies on equipment from scia Systems for the development of their advanced technologies. With the scia Cluster 200, we are providing the institute with a high-performance solution that covers a wide range of coating and structuring processes and creates optimal conditions for advancing research in this forward-looking field of technology," says Dr. Michael Zeuner, Managing Director of scia Systems GmbH. 

 

About scia Systems GmbH

Founded in 2013, scia Systems is a technology leader in thin-film process equipment based on advanced ion beam and plasma technologies. The systems are used for coating, etching, and cleaning processes with nanometer resolution and have been successfully implemented in various high-tech industries worldwide, including microelectronics, MEMS, and precision optics industries. For more information, visit the company’s website at www.scia-systems.com.

 

About Fraunhofer ENAS

The strength of the Fraunhofer Institute for Electronic Nano Systems ENAS lies in the holistic development of “intelligent systems” for a wide range of applications. The institute's research activities range from the development of advanced wafer and packaging technologies to the production of electronic components, micro- and nanosensors, and actuators, as well as the development of system concepts and system integration technologies, including communication interfaces. Using state-of-the-art, AI-supported testing and reliability methods, Fraunhofer ENAS translates the developed solutions into practical applications. The institute supports customer projects from the initial idea through design, technology development, or implementation using existing technologies, right up to the tested prototype. www.enas.fraunhofer.de

 

Company Contact

scia Systems GmbH
Mandy Gebhardt
Head of Marketing
Tel: +49 371 33561 322
E-Mail: m.gebhardt@scia-systems.com

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