Latest Company News

scia Systems scores a Triple: three scia Mill 150 conquer the Chinese University Market

scia Systems repeatedly shows its skills in the delivery of industry-standard equipment for university applications to three renowned Chinese universities. The three scia Mill 150 systems will be used for full surface etching of substrates up to 150 mm. They go to Xi’an Jiaotong University (XJTU), the Zhejiang University located in Hangzhou and the ShanghaiTech University...

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scia Mill 150

All training places assigned

Successfully, we were able to fill our vacancies for apprenticeships starting in fall 2021. We wish our future trainees a successful graduation and look forward to accompanying them into a new phase of their lives.

Our sustainable training concept includes, in addition to our own training capacities, a close cooperation with the Bildungs-Werkstatt Chemnitz. This joint apprenticeship enables to us to convey all educational contents to our trainees, according the Vocational Training Act. The Bildungs-Werkstatt Chemnitz, with its modern and qualified educational offerings, is a strong partner in continuously improving our apprenticeship quality today and in the future.

We look forward to continuing our successful cooperation. We will publish our vacancies for apprenticeship in 2022 in the fall of this year.

Dual leadership at scia Systems: We welcome Dr. Michael Gempe as CEO

We are pleased to welcome Dr. Michael Gempe as new member of the management board of scia Systems. Together with Dr. Michael Zeuner, the two CEOs form the top management team that combines various professional backgrounds and continue the success of scia Systems.

"The combination of innovative technology and a high level of personal commitment of the employees is what makes scia Systems so successful and has convinced me to move to Chemnitz." says Dr. Michael Gempe...

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Dr. Michael Gempe and Dr. Michael Zeuner

Successful development in research project HiPERFORM

With the substrate holder designed by scia Systems, epitaxial Aluminum Nitride (epi-AlN) can now be deposited on silicon (111). This is an important step for the development of GaN-based switch technologies. As these have up to 30% less energy losses compared to existing architectures, they can be used to produce more affordable and efficient electric and hybrid vehicles.

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HiPERFORM process chamber

scia Mill 300: Structuring of complex multilayers on 300 mm wafers

Increased wafer-size means lower costs. With our new system, scia Mill 300, you can benefit from all the advantages of ion beam etching on 300 mm wafers, such as excellent accuracy and uniformity, adjustable etch angle and processing of complex multilayers with inert and reactive gases.

Just like the other systems in the scia Mill-series, the scia Mill 300 has a full reactive gas compatibly, which enables reactive etch processes like reactive ion beam etching (RIBE) and chemically assisted ion beam etching (CAIBE).

Due to the flexible design, the system is suitable for high-volume and for small scale production.

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scia Mill 300

NEW APPLICATION NOTE: Ion Beam Etching for Reverse Engineering

As modern chip design pushes for smaller, more powerful and more compact devices, reverse engineering requires delayering with highest accuracy within the µm-, nm and atomic thickness range for different materials at once. Ion beam etching is capable to meet these strict requirements.

Learn more in our new application note.

 

Reverse Engineering

New Intro Video

With the increasing digitalization of conferences and exhibitions, we had to rethink and go a new way to present ourselves and our range of services.

You can see the result here: Our new video gives you a little insight into scia Systems in 30 seconds.

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Video