scia Batch 350 – Biocompatible coatings on 3D-substrates

by Plasma Enhanced Chemical Vapor Deposition (PECVD)

scia Batch 350

The scia Batch 350 is designed for homogeneous coating of several 3‑dimensional shaped substrates in one batch. Typical applications are biocompatible films for medical objects.

The scia Batch 350 uses a RF parallel plate arrangement with rotation of each substrate for a homogeneous coating of all sides. The system is also available with an additional DC bias applied to the substrate holder.

Technical Data

Carrier size

2 carriers with maximum size of 350 mm x 240 mm

Substrate holder

Water cooled, pulsed DC bias

Plasma source

RF parallel plate arrangement, 13.56 MHz

Max. RF power

2 x 600 W

Electrode setup

Temperature: Heating up to 400°C
Distance: Adjustable between 50 mm and 150 mm

Operation modes

Independent or coupled electrodes

Typical deposition rate SiC: 5 nm/min

Base Pressure

< 5 x 10-7 mbar

System dimensions (W x D x H)

0.90 m x 1.70 m x 2.30 m (without electrical rack and pumps)

Tool configuration

1 process chamber with manual loading

Software interface

SECS II / GEM

Features

  • Two independently operating opposite
    RF electrodes
  • Coupled or decoupled operation mode
    of electrodes
  • Deposition on 3D‑substrates in batches
  • Homogeneous gas inlet with gas shower near discharge area
  • Substrate holder with DC bias

Applications

  • Biocompatible films for medical objects
    (e.g. pacemakers and stents)

Principle 3D PECVD coatings

Principle 3D PECVD coatings by scia Batch 350

More PECVD/RIE Systems

scia Cube 300/750
for large area PECVD and RIE processing