scia Mill 150 - Precise Surface Structuring

by Ion Beam Milling/Etching (IBM/IBE)

scia Mill 150

The scia Mill 150 is designed for highly uniform Ion Beam Etching and Milling of single substrates up to 150 mm diameter. Carriers or wafers are loaded via an automatic handling system. The substrate holder has helium backside cooling and can be tilted and rotated. Typical applications are the structuring of metal films for MEMS and sensors.

The scia Mill 150 can be used for Ion Beam Etching (IBE) with inert gases. Additionally the system can be applied for Reactive Ion Beam Etching (RIBE) as well as for Chemically Assisted Ion Beam Etching (CAIBE).

The systems are especially appropriate for research and development and low volume production.

Technical Data

Substrate Holder

Water cooled, helium backside cooling contact, Substrate rotation 5 to 20 rpm, Tiltable in-situ from 0° till 160° in 0.1° steps

Ion Beam Source

Circular microwave ECR-source MW218‑e

Neutralizer

Triple plasma bridge neutralizer N-3DC

Typical removal rates

SiO2: 20 nm/min; TiW: 12 nm/min; Cu: 24 nm/min

Uniformity variation≤ 1.0 %

Base pressure

< 1 x 10-6 mbar

System dimensions (W x D x H)

1.70 m x 1.70 m x 1.70 m (without electrical rack)

Tool configurations

1 process chamber, 1 load-lock optional

Software interfaces

SECS II / GEM

Features

  • Large area Ion Beam Etching
  • IBE with inert gases
  • RIBE and CAIBE with reactive gases
  • Etching under a defined angle
  • Water cooled substrate holder with helium backside cooling contact

Applications

  • Structuring of MEMS, MRAM and sensors
    For example:

  • Structuring of metallic and dielectric multilayers
  • Ion Beam Polishing
  • Microstructuring
  • Reactive etching of III/V Semiconductors
    (e.g. GaAs, GaN, InP)

Principle Ion Beam Etching

Principle of Ion Beam Etching by scia Mill 150

More Ion Beam Systems

scia Mill 200
for etching of wafers
up to 200 mm
scia Trim 200
for focused trimming of wafers
up to 200 mm
scia Coat 200
for deposition on wafers
up to 200 mm
scia Coat 500
for deposition on optical substrates
up to 500 mm x 300 mm